Large Negative Photoresistivity in Amorphous NdNiO3 Film

Amorphous thin film growth: minimal deposition equation

A nonlinear stochastic growth equation is derived from (i) the symmetry principles relevant for the growth of vapor deposited amorphous films, (ii) no excess velocity, and (iii) a low-order expansion in the gradients of the surface profile. A growth instability in the equation is attributed to the deflection of the initially perpendicular incident particles due to attractive forces between the ...

Negative Magnetoresistance in Amorphous Indium Oxide Wires

We study magneto-transport properties of several amorphous Indium oxide nanowires of different widths. The wires show superconducting transition at zero magnetic field, but, there exist a finite resistance at the lowest temperature. The R(T) broadening was explained by available phase slip models. At low field, and far below the superconducting critical temperature, the wires with diameter equa...

Novel Approaches to Amorphous Silicon Thin Film Transistors for Large Area Electronics

While scaling VLSI devices to ever shrinking dimensions has driven much of the improvement in performance and reduction in cost of electronic intelligence, a new set of challenges and opportunities has emerged in a drastically different regime. As systems become more and more powerful, they are no longer limited by their electronic information processing capability, but by the human-machine int...

Dry etching characteristics of amorphous As2S3 film in CHF3 plasma

The authors describe the dry etching characteristics of amorphous As2S3 films in CHF3 plasma and the development of an optimized fabrication process for compact waveguides. The observed etching behavior is due to the relative densities of fluorine atoms, polymer precursors, and ions in the plasma which are controlled by the process parameters. In particular, the flow rate of the CHF3 gas has a ...

Charge blocking layers in thin-film/amorphous photovoltaics